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Contact (User Office)

 

Karlsruhe Nano Micro Facility
KIT-Campus North

Building 440

H.-von-Helmholtz-Platz 1

76344 Eggenstein-Leopoldshafen, Germany

 

phone: +49(721)608-23123

fax: +49(721)608-26273

knmf-userofficeNld1∂kit edu

User Office

KNMF Profile

Electron Beam Lithography (EBL)

KNMF Laboratory for Micro- and Nanostructuring

E-Beam VB6 UHR-EWF

  • Substrate: 4” and 6“ wafer; special piece parts (on request, minimum size 20 mm x 20 mm)
  • High voltage: 100 kV
  • Main field: ≤ 1310 μm
  • Resolution: < 1 nm (depends on main field size)

E-Beam lithography in extremely thick PMMA (3200 nm) with structural details in submicron range (~ 200 nm)

E-Beam lithography down to 20 nm scale in PMMA (resist thickness < 100 nm).

Download technology description (PDF)

Contact

Prof. Dr. Christian Koos

Phone +49 721 608-22770
Fax +49 721 608-23928
Email christian koosGte6∂kit edu

Dr. Lothar Hahn

Phone +49 721 608-23852
Fax +49 721 608-24331
Email lothar hahnSne8∂kit edu

Institute of Microstructure Technology (IMT) - www.imt.kit.edu

Features

  • Aspect ratio up to 10 depending on geometry
  • Structural details ≥ 20 nm
  • Resist thickness up to 3200 nm
    (e.g. for electroplating of high aspect ratio gold structures required for X-ray lithography)

Limitations/constraints

  • Standard Resist: PMMA

Design rules

  • Rounding of structural edges
  • Design of dummy structures for stress reduction
  • Homogeneous structure allocation (in case of subsequent electroplating)

Materials

Substrate materials: silicon, glass, metal
Other resist and substrate materials on request