Nanolithography, bionics, scanning probe technology, AFM andt-SPL, large area nano- and micro-structuring and molding up to qm-scale, polymer phase separation, (guided) self-assembly, block copolymers, nanoporous anti-reflective layers (organic and inorganic), metal-organic layers, SAMs, MOFs, SCMOLs, electrochemistry, single atom transistors, superhydrophobic surfaces, surfaces holding air under water, salvinia effect.

Elected member of the following KIT committees:
KIT Convention, KIT Division Council 5 (Physics and Mathematics), INT-ILA, Program Committees Natural, Artificial and Cognitive Information Processing (NACIP) and Materials Systems Engineering (MSE).